| 发明名称 |
PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist composition excellent in CDU (critical dimension uniformity), LWR (line width roughness) performance and cross-sectional shape rectangularity.SOLUTION: The photoresist composition includes: [A] a polymer having a specified acrylic structural unit having a (5-oxo-4-oxatricyclo[4.3.1.1]undecane structure in a side chain; and [B] an acid generator. |
| 申请公布号 |
JP2013225094(A) |
申请公布日期 |
2013.10.31 |
| 申请号 |
JP20120219897 |
申请日期 |
2012.10.01 |
| 申请人 |
JSR CORP |
发明人 |
MIYATA HIROMU;NAKAJIMA HIROMITSU;YOSHIDA MASASHI;KASAHARA KAZUKI |
| 分类号 |
G03F7/039;C08F20/28;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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