发明名称 |
IMPRINT MATERIAL HAVING LOW MOLD RELEASE STRENGTH |
摘要 |
[Problem] To provide: an imprint material which enables a resin film to be easily released from a mold during the mold releasing after curing, namely an imprint material which forms a film that has low mold release strength, high transparency, high abrasion resistance and high fingerprint wiping-off properties; and a film which is formed from the imprint material and to which a pattern is transferred. [Solution] An imprint material which contains: a compound which has two polymerizable groups and a propylene oxide unit or a propylene oxide unit and an ethylene oxide unit (component (A)); a silicone compound (component (B)); and a photopolymerization initiator (component (C)). |
申请公布号 |
WO2013161630(A1) |
申请公布日期 |
2013.10.31 |
申请号 |
WO2013JP61291 |
申请日期 |
2013.04.16 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
KOBAYASHI, JUNPEI;KATO, TAKU;SHUTO, KEISUKE;SUZUKI, MASAYOSHI |
分类号 |
H01L21/027;B29C59/02;C08F16/26;C08F20/28 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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