SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method are provided to prevent the drop of a cleaning solution on a substrate by spraying a drying gas to an injection head. CONSTITUTION: A nozzle arm (62) includes an injection head on a front end part. The injection head sprays a processing liquid onto a substrate. A standby port accommodates the injection head. A rotation driving part (63) rotates the nozzle arm. A shower nozzle (71) sprays a cleaning solution to the nozzle arm.