发明名称 METHOD OF PREPARING PRIMARY REFRACTORY METAL
摘要 A method of preparing primary refractory metals (e.g., primary tantalum metal) by contacting a particulate refractory metal oxide (e.g., tantalum pentoxide) with a heated gas (e.g., a plasma), is described. The heated gas comprises hydrogen gas. The temperature range of the heated gas and the mass ratio of hydrogen gas to refractory metal oxide are each selected such that: (i) the heated gas comprises atomic hydrogen; (ii) the refractory metal oxide feed material is substantially thermodynamically stabilized (i.e., the concurrent formation of suboxides that are not reduced by atomic hydrogen is minimized); and (iii) the refractory metal oxide is reduced by contact with the heated gas, thereby forming primary refractory metal (e.g., primary tantalum metal and/or primary niobium metal).
申请公布号 KR101323696(B1) 申请公布日期 2013.10.31
申请号 KR20077024102 申请日期 2006.03.15
申请人 发明人
分类号 C22B5/12;C22B34/00;C22B34/20;C22B34/24 主分类号 C22B5/12
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