METAL DEPOSITION FILM

摘要

The present invention achieves in a metal deposition film an unprecedented uniformity of flow in an electrical current in a metal deposition segment demarcated by non-deposition slits. The shape of a non-deposition slit (20) is a wave shape in which first slits (25) formed along a first curve (24) composed of an arc shape or an elliptical arc shape, and second slits (27) formed along a second curve (26) obtained by inverting the first curve (24), are connected alternately along the width direction. A plurality of the wave-shaped non-deposition slits (20) being formed while inverting so as to prevent intersection with the adjacent non-deposition slit (20) along the longitudinal direction orthogonal to the width direction. A fused section (22) is also formed at a connecting point (28) between the first curve (24) and the second curve (26), as well as at a narrow section where the distance between neighboring non-deposition slits (20) is narrowest.