SUBSTRATE PROCESSING DEVICE, MAINTENANCE METHOD AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To enable resetting an accumulated film thickness value of each dummy substrate when a dummy carrier is re-input.SOLUTION: A substrate processing device at least comprises: a processing chamber for processing a variety of predetermined number of substrates; a substrate housing unit having a mounted dummy carrier in which a dummy substrate, one type of the variety of substrates, is housed; a storage unit for retaining the film thickness value of each dummy substrate in the dummy carrier, when the dummy carrier is conveyed from the substrate housing unit; and when the dummy carrier is re-input to the substrate housing unit, a management unit for resetting the film thickness of each dummy substrate in the dummy carrier, on the basis of the film thickness value retained in the storage unit.