| 摘要 |
PROBLEM TO BE SOLVED: To provide a curable composition for nanoimprint excellent in chlorine gas-etching resistance, dispersibility and productivity; and a composition for photocurable nanoimprint allowing easy transcription of a pattern even when a metal-mold is pressed at a relatively low pressure.SOLUTION: A composition for photocurable nanoimprint contains (A) a hydrolysate mixture containing a hydrolysate of an organosilicon compound and a hydrolysate of an organosilicon compound having a (meta)acryl group, (B) a polymerizable monomer having a (meta)acryl group and (C) a photopolymerization initiator. In addition, the hydrolysate mixture (A) may contain a hydrolysate of a metal alkoxide. |
