| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method which is advantageous in reducing breakage of a mold or substrate due to contacting of the mold with the substrate where a pattern of a resin is formed by the mold.SOLUTION: There is provided an imprint method of coating a substrate with a resin and transferring an uneven pattern, formed on the mold by bringing the resin and mold into contact with each other, to the resin. Especially, the imprint method includes a step (S100) of acquiring a shot map preset including a plurality of shots arrayed in a lattice shape, and steps (S101-S104) of changing the shot map so as to decrease the number of peripheral shots that allow the mold and substrate to come into contact with each other not across the resin among peripheral shots included in the shots and located in an outer peripheral region of the substrate when the uneven pattern and resin are pressed from a top part of a projection shape by deforming the mold into the projection shape toward the substrate. |
