发明名称 Device for thermally treating wet substrate to increase dry substance content of substrate, for thermal treatment of e.g. sewage sludge, has outlet controlling amount of partially moisture-reduced substrate present in drying chamber
摘要 #CMT# #/CMT# The device has a centrifugal shaft (f) arranged in a housing, an inlet for a web substrate (e), and an outlet for a partially moisture-reduced substrate (g). A conveying device is arranged on the shaft for fragmented conveyance of a wet substrate in a drying chamber. The drying chamber comprises an inlet and an outlet for drying air. The drying chamber is designed for inputting thermal energy. The former outlet is designed to control an amount of the partially moisture-reduced substrate present in the drying chamber. #CMT# : #/CMT# An independent claim is also included for a method for thermally treating a wet substrate to increase a dry substance content of the substrate. #CMT#USE : #/CMT# Device for thermally treating a wet substrate to increase a dry substance content of the substrate, for thermal treatment of sewage sludge, fermenting residues of biological gas facility or liquid manure or thermal drying treatment of solutions provided with dry substances and/or suspensions to recover powdery dry substance (all claimed). #CMT#ADVANTAGE : #/CMT# The device enables simple and optimum drying of materials of the sewage sludge. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a schematic view of a device for thermally treating a wet substrate, for thermal treatment of sewage sludge. a : Centrifuge b : Supply container e : Web substrate f : Centrifugal shaft g : Partially moisture-reduced substrate.
申请公布号 CH706450(A2) 申请公布日期 2013.10.31
申请号 CH20120000586 申请日期 2012.04.29
申请人 MICHAEL GEISINGER 发明人 MICHAEL GEISINGER
分类号 F26B17/24 主分类号 F26B17/24
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