发明名称 FILM-FORMING METHOD AND FILM-FORMING DEVICE
摘要 A film-forming method of the present invention involves the following: supplying a first raw gas material composed of an acid anhydride and a second raw gas material composed of a diamine into an evacuated treatment vessel which holds a body to be treated; forming an insulating film composed of a polymer thin-film on the surface of the body to be treated; stopping the supply of the second raw gas material to the treatment vessel and continuing to supply the first raw gas material into the treatment vessel; and imparting a barrier function to the insulating film by reforming the insulating film. DRAWING: FIG. 4: S1 First step [Formation of polyimide film] (synchronous supply of PMDA and ODA) S2 Second step [Reforming treatment] (supply of PMDA) AA Film-forming method BB End
申请公布号 WO2013161772(A1) 申请公布日期 2013.10.31
申请号 WO2013JP61810 申请日期 2013.04.22
申请人 TOKYO ELECTRON LIMITED 发明人 SUGITA, KIPPEI;HASHIMOTO, HIROYUKI;HARADA, MUNEO
分类号 H01L21/312;C23C16/455;H01L21/768 主分类号 H01L21/312
代理机构 代理人
主权项
地址