| 摘要 |
PURPOSE: A tray for a substrate processing apparatus is provided to prevent the temperature rise of an upper plate by supplying helium gas to a gap between the upper surface of a lower plate and the lower surface of an upper plate. CONSTITUTION: A substrate mounting part mounts a substrate. A lower plate (61) comprises a cool air injection path for a substrate. The cool air injection for the substrate injects external helium gas to the lower surface of the substrate. An upper plate (62) has a through hole passing through the upper plate. A gap (63) is formed between the upper surface of the lower plate and the lower surface of the upper plate. |
