发明名称 |
Aqueous Cleaning Techniques and Compositions for use in Semiconductor Device Manufacturing |
摘要 |
Some embodiments relate to a manufacturing method for a semiconductor device. In this method, a semiconductor workpiece, which includes a metal gate electrode thereon, is provided. An opening is formed in the semiconductor workpiece to expose a surface of the metal gate. Formation of the opening leaves a polymeric residue on the workpiece. To remove the polymeric residue from the workpiece, a cleaning solution that includes an organic alkali component is used. |
申请公布号 |
US2013288436(A1) |
申请公布日期 |
2013.10.31 |
申请号 |
US201213459379 |
申请日期 |
2012.04.30 |
申请人 |
CHOU CHUN-LI;KU SHAO-YEN;CHEN PEI-HUNG;CHUANG JUI-PING;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHOU CHUN-LI;KU SHAO-YEN;CHEN PEI-HUNG;CHUANG JUI-PING |
分类号 |
H01L21/336;C11D3/28 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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