| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition capable of reducing a diffusion distance of an acid generated by exposure.SOLUTION: The resist composition comprises a base component (A) that generates an acid by exposure and shows changes in the solubility with a developing solution by an action of an acid. The base component (A) includes a structural unit (a0) expressed by (a0-1), a structural unit (a1) containing an acid decomposable group that increases polarity by an action of an acid, and a structural unit (a6) generating an acid by exposure. In the formula, Rrepresents a hydrogen atom, an alkyl group having Cto C, or a halogenated alkyl group having Cto C; W represents one of -COO-, -CONH- and a divalent aromatic hydrocarbon group; Yand Yrepresent a divalent linking group or a single bond; and Rrepresents a cyclic group having -SO-. |
