发明名称 PRINTED CHEMICAL MECHANICAL POLISHING PAD
摘要 A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.
申请公布号 WO2013162856(A1) 申请公布日期 2013.10.31
申请号 WO2013US35513 申请日期 2013.04.05
申请人 APPLIED MATERIALS, INC. 发明人 BAJAJ, RAJEEV;CHIN, BARRY, LEE;LEE, TERRANCE, Y.
分类号 H01L21/304;B24B37/04 主分类号 H01L21/304
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