发明名称 COATING METHOD FOR DEPOSITING LAYER STRUCTURE ON SUBSTRATE, AND SUBSTRATE HAVING LAYER STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a substrate having an improved layer structure which prevents the known shortcomings of prior art.SOLUTION: A coating method is for depositing a layer structure S made from a hard material layer on a substrate 1. The method includes a step of depositing at least one joining layer S1 containing an evaporation material M1 on the surface of the substrate 1 by cathodic vacuum arc evaporation process using only a cathodic vacuum arc evaporation source Q1, in a process chamber in which vacuum suction is possible. After deposition of the joining layer S1, at least one intermediate layer S2 containing the evaporation material M1 and a discharge material M2 is deposited as a layer of a hybrid phase or nano composite in the form of a mixed layer of nano structures by the parallel running of the cathodic vacuum arc evaporation source Q1 and a magnetron discharge source Q2. Next, at least one top layer S3 containing the discharge material M2 is deposited using only the magnetron discharge source Q2 to be operated in HIPIMS mode. There is also provided a substrate having a layer structure.
申请公布号 JP2013224489(A) 申请公布日期 2013.10.31
申请号 JP20130088013 申请日期 2013.04.19
申请人 SULZER METAPLAS GMBH 发明人 VETTER JOERG;ERKENS GEORG;MUELLER JUERGEN
分类号 C23C14/22 主分类号 C23C14/22
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