发明名称 |
LOCALIZED ATMOSPHERIC LASER CHEMICAL VAPOR DEPOSITION |
摘要 |
An atmospheric, Laser-based Chemical Vapor Deposition (LCVD) technique provides highly localized deposition of material to mitigate damage sites on an optical component. The same laser beam can be used to deposit material as well as for in-situ annealing of the deposited material. The net result of the LCVD process is in-filling and planarization of a treated site, which produces optically more damage resistant surfaces. Several deposition and annealing steps can be interleaved during a single cycle for more precise control on amount of deposited material as well as for increasing the damage threshold for the deposited material. |
申请公布号 |
WO2013163040(A1) |
申请公布日期 |
2013.10.31 |
申请号 |
WO2013US37416 |
申请日期 |
2013.04.19 |
申请人 |
LAWRENCE LIVERMORE NATIONAL SECURITY, LLC |
发明人 |
MATTHEWS, MANYALIBO JOSEPH;ELHADJ, SELIM |
分类号 |
H01L21/268;C03C15/02;C03C17/245 |
主分类号 |
H01L21/268 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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