| 摘要 |
<p>A spraying nozzle for a chemical vapor deposition process and a method for improving process uniformity are provided. The spraying nozzle is used for providing reaction gas for a substrate, and has a port, wherein a window transparent plate is arranged correspondingly with the port, the window transparent plate is adopted as an observation channel or a test channel, monitoring of a chemical vapor deposition process is performed through the window transparent plate, and purging gas is introduced between the window transparent plate and the port, and is provided for preventing the reaction gas from generating a chemical reaction or physical deposition on the window transparent plate. The condition of the substrate below the spraying nozzle can be real-time monitored during the chemical vapor deposition process by a person skilled in the art.</p> |
