| 摘要 |
<p>The invention relates to a method for repairing a collector for an EUV projection exposure apparatus having a first coating 24 and a second coating 21, wherein the first coating 24 is arranged between the second coating 21 and a surface of the collector, comprising the following method steps: - ' completely or partly removing the first coating (24) by treatment with a first chemical solution (30); applying a new first coating (24'). According to the invention, the first chemical solution 30 used is an agent which has a first etching rate in combination with the material 22, 23 of the first coating 24 and a second etching rate in combination with the material of the second coating 21, wherein the first etching rate is greater than the second etching rate at least by a factor of 5. The invention furthermore relates to a collector for an EUV projection exposure apparatus having a first coating 24, which comprises a metal, a metal oxide, a semiconductor oxide, a semiconductor nitride or a combination thereof, and having a second coating 21, which comprises a plurality of alternately deposited plies of molybdenum and silicon, wherein the first coating 24 is arranged between the second coating 21 and a surface of the collector.</p> |
