| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent damages on a mask by vibration in a proximity exposure apparatus. <P>SOLUTION: A substrate 1 is supported by a chuck 10, while a mask 2 is held by a mask holder 20. When vibration at a prescribed value or higher is detected, the gap between the mask holder 20 and the chuck 10 is broadened to prevent the mask 2 held by the mask holder 20 from contacting the chuck 10 or the substrate 1 supported by the chuck 10. Otherwise, when vibration at a prescribed value or higher is detected, a buffer member is inserted between the mask holder 20 and the chuck 10 or the substrate 1 supported by the chuck 10 so as to prevent the mask 2 held by the mask holder 20 from contacting the chuck 10 or the substrate 1 supported by the chuck 10. <P>COPYRIGHT: (C)2011,JPO&INPIT |
