发明名称 SEMICONDUCTOR DEVICE AND DISPLAY DEVICE
摘要 <p>A semiconductor device (100) according to the present invention is a semiconductor device with a thin-film transistor (10), and includes: a gate electrode (62) which has been formed on a substrate (60) as a part of the thin-film transistor (10); a gate insulating layer (66) which has been formed on the gate electrode (62); an oxide semiconductor layer (68) which has been formed on the gate insulating layer (66); a source electrode (70s) and a drain electrode (70d) which have been formed on the oxide semiconductor layer (68); a protective layer (72) which has been formed on the oxide semiconductor layer (68), the source electrode (70s) and the drain electrode (70d); an oxygen supplying layer (74) which has been formed on the protective layer (72); and an anti-diffusion layer (78) which has been formed on the oxygen supplying layer (74).</p>
申请公布号 EP2657974(A1) 申请公布日期 2013.10.30
申请号 EP20110851182 申请日期 2011.12.15
申请人 SHARP KABUSHIKI KAISHA 发明人 MORIGUCHI MASAO;KANZAKI YOHSUKE;TAKANISHI YUDAI;KUSUMI TAKATSUGU;MATSUKIZONO HIROSHI
分类号 H01L29/786;G02F1/1368;G09F9/30;H01L21/336;H01L27/12;H01L29/66;H01L51/50 主分类号 H01L29/786
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