POSITION MEASURING APPARATUS, PATTERN TRANSFER APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE

摘要

PURPOSE: A position measuring apparatus is provided to improve the measuring accuracy by reducing deformation to the plate width direction of a scale. CONSTITUTION: A position measuring apparatus is composed to measure the position of an object by using a scale of a plate form including a grid pattern. The position measuring apparatus comprises a support unit arranged between a structure and the scale to support the scale. The support unit comprises a spring element reducing the vibration delivered from the structure to the scale in the plate thickness direction. A pattern transfer apparatus is composed to transfer a pattern on a substrate. The pattern transfer apparatus comprises a moving member composed to mount the substrate and move, and a position measuring apparatus composed to measure the position of the moving member by using a scale of a plate form including a grid pattern.