Polybenzoxazoles and polybenzothiazoles precursors

摘要

Polybenzoxazole and polybenzothiazole precursors with good solubility in solvents and metal ion-free aqueous alkaline developers are used in photoresists with diazoketones in an organic solvent. Polybenzoxazole and polybenzothiazole precursors have a partial structure of formula (I). A<1>-A<7> = H, F, CH3, CF3, OCH3, OCF3, CH2CH3, CF2CF3, OCH2CH3 or OCF2CF3; T = O or S; m = 0 or 1; Z1 = specified group; provided that when Z1 = phenylene or m = 0, at least one of A<1>-A<7> is not H; An Independent claim is included for a photoresist comprising the above material and a diazoketone in organic solvent.