A METHOD FOR PROVIDING AN ECPR MASTER ELECTRODE

摘要

A method for providing a topographical pattern on a conducting or semiconducting carrier element of an ECPR master electrode is provided. The method comprises the steps of providing an etch mask on a front side of said carrier element; and etching said front side of said carrier element according to an reactive ion etch sequence, wherein said sequence comprises i) etching a first part of a trench of said carrier element using a predetermined set of constant etch parameters, and ii) etching a second part of said trench using a repeated cycle of a predetermined set of alternating etch parameters.