发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PURPOSE: A semiconductor device and a method for manufacturing the same are provided to obtain stable electrical properties by using an insulating layer including gallium oxide. CONSTITUTION: A first insulating layer is arranged on a first conductive layer. An oxide semiconductor layer (403) is arranged on the first insulating layer. A source electrode layer (405a) and a drain electrode layer (405b) are electrically connected to an oxide semiconductor layer. A second insulating layer is arranged on the source electrode layer and the drain electrode layer. A second conductive layer is arranged on the second insulating layer.</p> |
申请公布号 |
KR20130118792(A) |
申请公布日期 |
2013.10.30 |
申请号 |
KR20130042836 |
申请日期 |
2013.04.18 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI |
分类号 |
H01L29/786;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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