发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A semiconductor device and a method for manufacturing the same are provided to obtain stable electrical properties by using an insulating layer including gallium oxide. CONSTITUTION: A first insulating layer is arranged on a first conductive layer. An oxide semiconductor layer (403) is arranged on the first insulating layer. A source electrode layer (405a) and a drain electrode layer (405b) are electrically connected to an oxide semiconductor layer. A second insulating layer is arranged on the source electrode layer and the drain electrode layer. A second conductive layer is arranged on the second insulating layer.</p>
申请公布号 KR20130118792(A) 申请公布日期 2013.10.30
申请号 KR20130042836 申请日期 2013.04.18
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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