发明名称 COATING METHOD FOR DEPOSITING A LAYER SYSTEM ON A SUBSTRATE AND SUBSTRATE HAVING A LAYER SYSTEM
摘要 PURPOSE: A coating method for evaporating a layer system on a substrate, and a substrate including a layer system thereof are provided to manufacture a substrate which has an improved coating method for manufacturing a multilayer system, and an improved layer system for solving weaknesses of the conventional technology. CONSTITUTION: A coating method for evaporating a layer system on a substrate performs the following steps. A cathode arc evaporation source (Q1) including an evaporation material (M1), a magnetron discharge source (Q2) including a discharge material (M2), and an evacuable processing chamber (2) are provided. In a cathode vacuum arc evaporation process, one or more contact layers, which contain the evaporation material on the surface of a substrate, are evaporated only by a cathode vacuum arc evaporation source. After the evaporation of the contact layer, one or more middle layers, which contain the evaporation material and the discharge material, are evaporated in a mixed layer shape with a nanostructure, by parallel operation of the cathode vacuum arc evaporation source and the magnetron discharge source.
申请公布号 KR20130118813(A) 申请公布日期 2013.10.30
申请号 KR20130043395 申请日期 2013.04.19
申请人 SULZER METAPLAS GMBH 发明人 VETTER JOERG;ERKENS GEORG;MUELLER JUERGEN
分类号 C23C14/34;C23C14/35 主分类号 C23C14/34
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