发明名称 Optical mask for all-optical extended depth-of-field for imaging systems under incoherent illumination
摘要 A method of optical element manufacturing, the method may include selecting a range of a misfocus parameter psi; and designing the optical element to include multiple regions, wherein the optical transfer function (OTF) of the optical element allows, for the range of the misfocus parameter .psi., transmission of images with a contrast of at least 10% for all normalized spatial frequencies up to 50% of a theoretical maximum that is attainable with a full aperture in an in-focus condition.
申请公布号 US8570655(B2) 申请公布日期 2013.10.29
申请号 US201113027286 申请日期 2011.02.15
申请人 BEN-ELIEZER EYAL;MAROM EMANUEL;KONFORTI NAIM;ZALEVSKY ZEEV;RAMOT AT TEL AVIV UNIVERSITY LTD. 发明人 BEN-ELIEZER EYAL;MAROM EMANUEL;KONFORTI NAIM;ZALEVSKY ZEEV
分类号 G02B27/46 主分类号 G02B27/46
代理机构 代理人
主权项
地址
您可能感兴趣的专利