发明名称 |
Transmitting optical element and objective for a microlithographic projection exposure apparatus |
摘要 |
A transmitting optical element adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material, with the polycrystalline material having crystallites with a cubic crystal structure, and with the mean crystallite size of these crystallites being at least micrometers, and at most micrometers.
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申请公布号 |
US8570488(B2) |
申请公布日期 |
2013.10.29 |
申请号 |
US20050718146 |
申请日期 |
2005.12.08 |
申请人 |
CLAUSS WILFRIED;TOTZECK MICHAEL;RISSMANN GISELA;CARL ZEISS SMT GMBH |
发明人 |
CLAUSS WILFRIED;TOTZECK MICHAEL;MUELLER-RISSMANN WERNER |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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