| 摘要 |
A silver etchant composition is provided to prevent the damage of a bottom layer and to be used for a single layer and multilayer. A silver etchant composition comprises a phosphoric acid(H3PO4) of 40 - 60 weight%; a nitric acid(HNO3) of 3 - 8 weight%; an acetic acid(CH3COOH) of 12 - 20 weight%; the first sodium phosphate(NaH2PO4) of 0.1 - 3 weight%; and deionized water of the remaining amount to become 100 weight% of the total weight of whole composition. The etchant composition can etch a single layer consisting of silver(Ag) or silver alloy and a multilayer consisting of the single layer and an indium oxide film. The indium tin oxide is an indium tin oxide(ITO) or indium zinc oxide(IZO). |
