发明名称 |
Tip type probe manufacturing method, tip type probe and tip type probe manufacturing apparatus |
摘要 |
A manufacturing method of a tip type probe includes the steps of: forming on a substrate an etching mask of a shape similar to a shape of a top surface of a truncated pyramid; forming the truncated pyramid by subjecting the substrate to isotropic etching using the etching mask as a mask member; stopping the isotropic etching when an area of the top surface reaches an area capable of generating near-field light; and forming a metal film on at least some of the side surfaces of the truncated pyramid by allowing film forming particles to enter into a space between the etching mask and the side surfaces and adhere onto the truncated pyramid. The directivity of the film forming particles is controlled so that the metal film has a thickness that is reduced gradually from a bottom of the truncated pyramid toward the top surface.
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申请公布号 |
US8568598(B2) |
申请公布日期 |
2013.10.29 |
申请号 |
US20090735789 |
申请日期 |
2009.02.18 |
申请人 |
PARK MAJUNG;OUMI MANABU;SEIKO INSTRUMENTS INC. |
发明人 |
PARK MAJUNG;OUMI MANABU |
分类号 |
C23F1/00;G01Q60/22;G01Q80/00;G11B5/02;G11B5/127;G11B5/31;H01L21/20;H01L21/311;H04R31/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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