SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

摘要

PURPOSE: A photoresist composition provides a photoresist pattern with excellent line edge roughness. CONSTITUTION: A salt is represented by chemical formula 1. In chemical formula 1 Q^1 and Q^2 are a fluorine atom or a C1-6 perfluoroalkyl group; L^1 is a C1-17 divalent saturated hydrocarbon group; L^2 is a single bond or a C1-6 alkanediyl group; Y is a C3-18 aliphatic hydrocarbon group having one or more substituents; Z^+ is an organic counter ion. A photoresist composition comprises an acid generator including the salt and a resin having an acid-labile group which is insoluble to alkali aqueous solution but becomes soluble to alkali aqueous solution by the function of an acid.