发明名称 Integrated circuit with a fin-based fuse, and related fabrication method
摘要 Methods of fabricating an integrated circuit with a fin-based fuse, and the resulting integrated circuit with a fin-based fuse are provided. In the method, a fin is created from a layer of semiconductor material and has a first end and a second end. The method provides for forming a conductive path on the fin from its first end to its second end. The conductive path is electrically connected to a programming device that is capable of selectively directing a programming current through the conductive path to cause a structural change in the conductive path to increase resistance across the conductive path.
申请公布号 US8569116(B2) 申请公布日期 2013.10.29
申请号 US201113171228 申请日期 2011.06.28
申请人 MANN RANDY W.;MAITRA KINGSUK;MITTAL ANURAG;GLOBALFOUNDRIES, INC. 发明人 MANN RANDY W.;MAITRA KINGSUK;MITTAL ANURAG
分类号 H01L21/82;H01L21/44;H01L21/479 主分类号 H01L21/82
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