发明名称 |
Integrated circuit with a fin-based fuse, and related fabrication method |
摘要 |
Methods of fabricating an integrated circuit with a fin-based fuse, and the resulting integrated circuit with a fin-based fuse are provided. In the method, a fin is created from a layer of semiconductor material and has a first end and a second end. The method provides for forming a conductive path on the fin from its first end to its second end. The conductive path is electrically connected to a programming device that is capable of selectively directing a programming current through the conductive path to cause a structural change in the conductive path to increase resistance across the conductive path. |
申请公布号 |
US8569116(B2) |
申请公布日期 |
2013.10.29 |
申请号 |
US201113171228 |
申请日期 |
2011.06.28 |
申请人 |
MANN RANDY W.;MAITRA KINGSUK;MITTAL ANURAG;GLOBALFOUNDRIES, INC. |
发明人 |
MANN RANDY W.;MAITRA KINGSUK;MITTAL ANURAG |
分类号 |
H01L21/82;H01L21/44;H01L21/479 |
主分类号 |
H01L21/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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