发明名称 |
Forming nanometer-sized patterns by electron microscopy |
摘要 |
A method for forming nanometer-sized patterns and pores in a membrane is described. The method comprises incorporating a reactive material onto the membrane, the reactive material being a material capable of lowering an amount of energy required for forming a pore and/or pattern by irradiating the membrane material with an electron beam, thus leading to a faster pore and/or pattern formation.
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申请公布号 |
US8568605(B2) |
申请公布日期 |
2013.10.29 |
申请号 |
US201113299332 |
申请日期 |
2011.11.17 |
申请人 |
WALAVALKAR SAMEER;SCHERER AXEL;HOMYK ANDREW P.;CALIFORNIA INSTITUTE OF TECHNOLOGY |
发明人 |
WALAVALKAR SAMEER;SCHERER AXEL;HOMYK ANDREW P. |
分类号 |
C23F1/00;B44C1/22 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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