发明名称 Forming nanometer-sized patterns by electron microscopy
摘要 A method for forming nanometer-sized patterns and pores in a membrane is described. The method comprises incorporating a reactive material onto the membrane, the reactive material being a material capable of lowering an amount of energy required for forming a pore and/or pattern by irradiating the membrane material with an electron beam, thus leading to a faster pore and/or pattern formation.
申请公布号 US8568605(B2) 申请公布日期 2013.10.29
申请号 US201113299332 申请日期 2011.11.17
申请人 WALAVALKAR SAMEER;SCHERER AXEL;HOMYK ANDREW P.;CALIFORNIA INSTITUTE OF TECHNOLOGY 发明人 WALAVALKAR SAMEER;SCHERER AXEL;HOMYK ANDREW P.
分类号 C23F1/00;B44C1/22 主分类号 C23F1/00
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