| 摘要 |
PURPOSE: An electrode manufacturing method is provided to reduce manufacturing processes and costs by performing one etching process which etches photo-resist. CONSTITUTION: Photo-resist (104) is coated on a substrate. The photo-resist is patterned. An electrode material (106) is formed on the surface of the patterned photo-resist. The electrode material is eliminated. An electrode pattern (106') is formed on the substrate. |
