发明名称 WAFER SUCTION DEVICE AND WAFER SUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To easily bond a film to a chuck and cause the elastic film to suction a wafer without causing unevenness of adhesion strength.SOLUTION: A wafer suction device includes: a planar chuck (10) formed by a rigid material and generating a suction effect on its upper surface by vacuum; and an annular fixing member (52) having an inner diameter larger than an outer diameter of the chuck and fixing an elastic film having a number of suction holes to the inner side thereof. The annular member is moved down relative to the chuck, and the elastic film is stretched over the chuck with a uniform tensile force to be supported. The wafer is suctioned and held on the stretched elastic film.
申请公布号 JP2013222749(A) 申请公布日期 2013.10.28
申请号 JP20120091883 申请日期 2012.04.13
申请人 TOKYO SEIMITSU CO LTD 发明人 KANAZAWA MASAKI;FUJITA TAKASHI
分类号 H01L21/304;B24B41/06;H01L21/683 主分类号 H01L21/304
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