发明名称 PROCESS KIT AND TARGET FOR SUBSTRATE PROCESSING CHAMBER
摘要 <p>A process kit comprises a ring assembly that is placed about a substrate support in a substrate processing chamber to reduce deposition of process deposits on the chamber components and on an overhang edge of the substrate. The process kit includes a deposition ring, cover ring, and anti-lift bracket, and can also include a unitary shield. A target is also described.</p>
申请公布号 KR101322342(B1) 申请公布日期 2013.10.28
申请号 KR20060106729 申请日期 2006.10.31
申请人 发明人
分类号 H01L21/00;H01L21/02 主分类号 H01L21/00
代理机构 代理人
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