发明名称 METAL GRID IN BACKSIDE ILLUMINATION IMAGE SENSOR CHIPS AND METHODS FOR FORMING THE SAME
摘要 PURPOSE: A metal grid in backside illumination image sensor chips and a method for forming the same are provided to reduce optical crosstalk of a light received by different image sensors, by forming metal grids to isolate the light. CONSTITUTION: A plurality of image sensors (24) is formed on the front side of a semiconductor substrate (26). A dielectric layer is formed on the backside of the semiconductor substrate. The dielectric layer is patterned into a plurality of grid charging regions (42). A metal layer is formed between the upper surfaces and the side walls of the plurality of grid charging regions. A metal grid (44) is formed on the side walls of the plurality of grid charging regions. Grid open apertures of the metal grid are filled with a transparent material.
申请公布号 KR20130117634(A) 申请公布日期 2013.10.28
申请号 KR20120149132 申请日期 2012.12.20
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 WANG CHIH CHIEN;CHANG CHUN WEI;MO WANG PEN;HSIEH HUNG CHANG
分类号 H01L27/146 主分类号 H01L27/146
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