发明名称 |
METAL GRID IN BACKSIDE ILLUMINATION IMAGE SENSOR CHIPS AND METHODS FOR FORMING THE SAME |
摘要 |
PURPOSE: A metal grid in backside illumination image sensor chips and a method for forming the same are provided to reduce optical crosstalk of a light received by different image sensors, by forming metal grids to isolate the light. CONSTITUTION: A plurality of image sensors (24) is formed on the front side of a semiconductor substrate (26). A dielectric layer is formed on the backside of the semiconductor substrate. The dielectric layer is patterned into a plurality of grid charging regions (42). A metal layer is formed between the upper surfaces and the side walls of the plurality of grid charging regions. A metal grid (44) is formed on the side walls of the plurality of grid charging regions. Grid open apertures of the metal grid are filled with a transparent material. |
申请公布号 |
KR20130117634(A) |
申请公布日期 |
2013.10.28 |
申请号 |
KR20120149132 |
申请日期 |
2012.12.20 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
WANG CHIH CHIEN;CHANG CHUN WEI;MO WANG PEN;HSIEH HUNG CHANG |
分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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