发明名称 |
METHOD FOR PRODUCING POLYMER, METHOD FOR PRODUCING RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREON |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a polymer, by which variation among lots of the polymer can be further reduced.SOLUTION: A method for producing a polymer includes: a polymerization step of polymerizing a monomer in a reaction liquid comprising a polymerization solvent, the monomer and a polymerization initiator in a reaction vessel; and a reaction termination step of terminating the polymerization reaction. The method also includes a monomer supply step of continuously supplying or dropping the monomer into the reaction vessel in a polymerization reaction period from a time when the polymerization reaction is started to a time when a termination operation is started. The content of the monomer in the reaction liquid in a monomer supply period from the start to the end of the monomer supply step is controlled to 2 to 16 mass%. |
申请公布号 |
JP2013221127(A) |
申请公布日期 |
2013.10.28 |
申请号 |
JP20120094935 |
申请日期 |
2012.04.18 |
申请人 |
MITSUBISHI RAYON CO LTD |
发明人 |
YASUDA ATSUSHI;OSHIKIRI TOMOYA;MUKAI KAZUAKI |
分类号 |
C08F2/00;C08F2/04 |
主分类号 |
C08F2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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