发明名称 METHOD FOR PRODUCING POLYMER, METHOD FOR PRODUCING RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREON
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a polymer, by which variation among lots of the polymer can be further reduced.SOLUTION: A method for producing a polymer includes: a polymerization step of polymerizing a monomer in a reaction liquid comprising a polymerization solvent, the monomer and a polymerization initiator in a reaction vessel; and a reaction termination step of terminating the polymerization reaction. The method also includes a monomer supply step of continuously supplying or dropping the monomer into the reaction vessel in a polymerization reaction period from a time when the polymerization reaction is started to a time when a termination operation is started. The content of the monomer in the reaction liquid in a monomer supply period from the start to the end of the monomer supply step is controlled to 2 to 16 mass%.
申请公布号 JP2013221127(A) 申请公布日期 2013.10.28
申请号 JP20120094935 申请日期 2012.04.18
申请人 MITSUBISHI RAYON CO LTD 发明人 YASUDA ATSUSHI;OSHIKIRI TOMOYA;MUKAI KAZUAKI
分类号 C08F2/00;C08F2/04 主分类号 C08F2/00
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