发明名称 UNIT FOR ION-RAY AND PLASMA PROCESSING
摘要 FIELD: machine building.SUBSTANCE: unit cylindrical vacuum chamber 1 has loading door 11 equipped with flange joints for mounting of process modules 4, 5, 6, 7, 8. Unit Incorporates gas feed system, exhaust system supply sources and control unit. Besides, it comprises rotary mount for parts to be processed. Unit process modules may be composed of at least one elongated vacuum-arc generator of metal plasma, elongated generator of gas plasma, medium-frequency dual magnetron, metal ion source and gas ion source. Besides, it comprises shift voltage source to support ion implantation and/or coat deposition.EFFECT: complex surface processing including surface purification and activation, application of various coats, modification of surface by metal and gas plasma.17 cl, 2 dwg, 1 tbl, 1 ex
申请公布号 RU2496913(C2) 申请公布日期 2013.10.27
申请号 RU20110154038 申请日期 2011.12.28
申请人 OBSHCHESTVO S OGRANICHENNOJ OTVETSTVENNOST'JU "NAUCHNO-PROIZVODSTVENNOE PREDPRIJATIE "URALAVIASPETSTEKHNOLOGIJA" 发明人 SMYSLOV ANATOLIJ MIKHAJLOVICH;DYBLENKO JURIJ MIKHAILOVICH;SMYSLOVA MARINA KONSTANTINOVNA;MINGAZHEV ASKAR DZHAMILEVICH;GORDEEV VJACHESLAV JUR'EVICH;GONTJUREV VASILIJ ANDREEVICH;RJABCHIKOV ALEKSANDR IL'ICH;STEPANOV IGOR' BORISOVICH
分类号 C23C14/48;C23C14/24;C23C14/35 主分类号 C23C14/48
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