| 摘要 |
An ultraviolet curing system separates the source of ultraviolet radiation and the controller, allowing an operator to stand at a relatively great distance away from the ultraviolet radiation when applied. The apparatus includes a base unit and a source of intense ultraviolet (UV) radiation coupled to the base unit by way of a pivoting arm. A controller, disposed remotely from the base unit, allows an operator to activate the source of UV radiation at a distance of at least several feet away from the source. The preferred embodiment allows an operator to control the UV radiation at a distance of 10 to 100 feet or more using a wired or wireless interconnection between the controller and the base unit. A detachable infrared lamp may be optionally disposed along side the UV source.
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