| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method advantageous to improve throughput.SOLUTION: An imprint method includes: a step S103 of changing a location of a detector which detects an alignment mark formed in a shot on a substrate; a step S106 of bringing a pattern formed on a mold into contact with an imprint material supplied to the shot on the substrate; and a step S108 of detecting the alignment mark using the detector after the location of the detector has been changed. The step of bringing the pattern into contact with the imprint material is started before change of the location of the detector is completed. |
