发明名称 FIN FIELD EFFECT TRANSISTORS
摘要 Field effect transistors include a source region and a drain region on a substrate, a fin base protruding from a top surface of the substrate, a plurality of fin portions extending upward from the fin base and connecting the source region with the drain region, a gate electrode on the fin portions, and a gate dielectric between the fin portions and the gate electrode.
申请公布号 US2013277720(A1) 申请公布日期 2013.10.24
申请号 US201313780855 申请日期 2013.02.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM MYEONG-CHEOL;KIM CHEOL;SEO JAEHUN;LEE YOOJUNG;CHANG KISOO;CHOI SIYOUNG
分类号 H01L29/78 主分类号 H01L29/78
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