| 发明名称 |
SUSCEPTOR ASSEMBLIES FOR SUPPORTING WAFERS IN A REACTOR APPARATUS |
| 摘要 |
Apparatus and methods for wafer processes such as etching and chemical vapor deposition processes are disclosed. In some embodiments, the apparatus includes a susceptor and a ring disposed beneath the susceptor to influence a thickness of the deposited epitaxial layer. |
| 申请公布号 |
WO2013158492(A1) |
申请公布日期 |
2013.10.24 |
| 申请号 |
WO2013US36381 |
申请日期 |
2013.04.12 |
| 申请人 |
MEMC ELECTRONIC MATERIALS, INC. |
发明人 |
PITNEY, JOHN A.;HAMANO, MANABU |
| 分类号 |
C30B25/10;C23C16/458;C23C16/52;C30B25/12;C30B25/16;H01L21/687 |
主分类号 |
C30B25/10 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
