发明名称 |
METHOD FOR FORMING FINE STRUCTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a fine structure capable of forming a nano-level structure reforming part etched at a stable etching speed when the structure reforming part is formed by collecting and emitting a laser beam having a picosecond order or shorter of pulse width to a substrate and by scanning a focus of the laser beam.SOLUTION: A method for forming a fine structure includes: a first step of forming a structure reforming part 103 within a base body 101 by collecting and emitting a laser beam 102 which is emitted from a light source and has a picosecond order or shorter of pulse width to inside of the base body 101 and by scanning a focus 102f; and a second step of forming a fine hole within the base body 101 by etching the structure reforming part 103. The laser beam 102 used in the first step is converted to a circularly polarized laser beam, and intensity at the focus 102f is larger than intensity required for forming the structure reforming part 103 when a linearly polarized laser beam is emitted to the base body 101. |
申请公布号 |
JP2013215766(A) |
申请公布日期 |
2013.10.24 |
申请号 |
JP20120087969 |
申请日期 |
2012.04.06 |
申请人 |
FUJIKURA LTD;UNIV OF TOKYO |
发明人 |
WAKIOKA HIROYUKI;YAMAMOTO SATOSHI;SUGIYAMA MASAKAZU |
分类号 |
B23K26/38;B23K26/00;B23K26/40 |
主分类号 |
B23K26/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|