| 摘要 |
The present invention relates to a nozzle (8) and nozzle head (1) arranged to subject a surface of a substrate (100) to gaseous precursors. The nozzle (8) comprises an output face (24) via which the precursor is supplied, a longitudinal precursor supply element (30, 50) for supplying precursor and a longitudinal discharge channel (6) open to and along the output face (24) for discharging at least a fraction of the precursor supplied from the precursor channel (10). The precursor supply element (30, 0) is arranged to extend inside the discharge channel (6) such that the precursor supply element (30, 50) divides the discharge channel (6) in the longitudinal direction to a first discharge sub-channel (7) and a second discharge sub-channel (9) on opposite sides of the precursor supply element (30, 50) for supplying precursor through the discharge channel (6). |
