发明名称 LIQUID TREATMENT DEVICE, LIQUID TREATMENT METHOD, AND FILTER DEVICE
摘要 <p>The present invention is a liquid treatment device for treating a substrate held in a substrate-holding unit by supplying a treatment fluid containing a polymer material from a nozzle to said substrate, the liquid treatment device having: a supply channel for supplying the treatment fluid to the nozzle; a filter for removing minute foreign matter from the treatment fluid, and positioned in the supply channel; and a grounded conductive member positioned so as to contact the treatment fluid on the downstream side of the filter in the supply channel, in order to remove the electricity from the polymer charged by passage through the filter. Furthermore, the present invention makes it possible to suppress the generation of minute foreign matter which is caused by the charging of the polymer.</p>
申请公布号 WO2013157366(A1) 申请公布日期 2013.10.24
申请号 WO2013JP58989 申请日期 2013.03.27
申请人 TOKYO ELECTRON LIMITED 发明人 SHIBATA, TSUYOSHI
分类号 H01L21/027;B05C11/10;G03F7/16 主分类号 H01L21/027
代理机构 代理人
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