| 摘要 |
PURPOSE: A substrate processing apparatus is provided to prevent the contamination of a reaction chamber by forming a shielding gas injection block. CONSTITUTION: A chamber has a reaction space. A gas injection device is formed in an upper part in the chamber. The gas injection device sprays a reaction gas. A shielding gas injection block (10) surrounds the inner wall of the chamber. The shielding gas injection block supplies the shielding gas to the inside of the chamber. |
