发明名称 PHOTOSENSITIVE RESIN COMPOSITION, FILM-SHAPED RESIN, RESIN SHEET, RESIN PATTERN, SEMICONDUCTOR WAFER WITH RESIN LAYER, TRANSPARENT SUBSTRATE WITH RESIN LAYER, SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in pattern forming property, embeddability and connectability, a film-shaped resin using the photosensitive resin composition, a resin sheet, a resin pattern, a semiconductor wafer with a resin layer, a transparent substrate with a resin layer, a semiconductor device and a method for manufacturing a semiconductor device.SOLUTION: The present invention relates to a photosensitive resin composition which includes an acrylic polymer having a structural unit represented by formula (1), a (meth)acrylate compound, an epoxy resin and a photoinitiator. In the formula, Rrepresents H or methyl; Rrepresents 1-4C alkyl, and x denotes an integer of 0-4.
申请公布号 JP2013216804(A) 申请公布日期 2013.10.24
申请号 JP20120089320 申请日期 2012.04.10
申请人 HITACHI CHEMICAL CO LTD 发明人 MITSUKURA KAZUYUKI;MINEGISHI TOMONORI
分类号 C08G59/62;H01L21/52;H01L21/60;H01L23/29;H01L23/31;H01L25/065;H01L25/07;H01L25/18 主分类号 C08G59/62
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