| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for generating a mask pattern which improves resolution characteristics of a main pattern.SOLUTION: The method includes obtaining data on a main pattern to be formed on a substrate, and data on a pattern of a lower layer of a layer to which the main pattern is transferred, setting a generation condition for an auxiliary pattern with respect to the main pattern using data on the pattern of the lower layer, determining the auxiliary pattern using the generation condition, and generating data on the mask pattern including the main pattern and the determined auxiliary pattern. |
