发明名称 |
Semiconductor Device and Method for Forming Same |
摘要 |
A system and method for forming a resistor system is provided. An embodiment comprises a resistor formed in a U-shape. The resistor may comprise multiple layers of conductive materials, with a dielectric layer filling the remainder of the U-shape. The resistor may be integrated with a dual metal gate manufacturing process or may be integrated with multiple types of resistors.
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申请公布号 |
US2013277750(A1) |
申请公布日期 |
2013.10.24 |
申请号 |
US201213451261 |
申请日期 |
2012.04.19 |
申请人 |
LAI JUI-YAO;LEE CHUN-YI;WANG SHYH-WEI;CHEN YEN-MING;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LAI JUI-YAO;LEE CHUN-YI;WANG SHYH-WEI;CHEN YEN-MING |
分类号 |
H01L27/06;H01L27/08 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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