发明名称 Semiconductor Device and Method for Forming Same
摘要 A system and method for forming a resistor system is provided. An embodiment comprises a resistor formed in a U-shape. The resistor may comprise multiple layers of conductive materials, with a dielectric layer filling the remainder of the U-shape. The resistor may be integrated with a dual metal gate manufacturing process or may be integrated with multiple types of resistors.
申请公布号 US2013277750(A1) 申请公布日期 2013.10.24
申请号 US201213451261 申请日期 2012.04.19
申请人 LAI JUI-YAO;LEE CHUN-YI;WANG SHYH-WEI;CHEN YEN-MING;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LAI JUI-YAO;LEE CHUN-YI;WANG SHYH-WEI;CHEN YEN-MING
分类号 H01L27/06;H01L27/08 主分类号 H01L27/06
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