发明名称 ELECTRICAL INTERCONNECTION STRUCTURE AND ELECTRICAL INTERCONNECTION METHOD
摘要 An electrical interconnection structure includes: a signal transmission structure having a first through silicon via (TSV) and signal circuits connected to two opposite ends of the first TSV, respectively; and a grounding structure having a second TSV and grounding layers connected to two opposite ends of the second TSV, respectively. The grounding layers surround the signal circuits along the pathways thereof such that the ends of the first TSV are surrounded by the grounding layers with gaps therebetween. By changing the gaps between the grounding layers and the ends of the first TSV, the capacitance between the grounding layers and the signal circuits is adjusted so as to regulate the impedance therebetween.
申请公布号 US2013277858(A1) 申请公布日期 2013.10.24
申请号 US201213628620 申请日期 2012.09.27
申请人 SILICONWARE PRECISION INDUSTRIES CO., LTD. 发明人 SUNG TSE-SHIH;CHIANG WEN-JUNG;LEE HSIN-HUNG
分类号 H01L23/48 主分类号 H01L23/48
代理机构 代理人
主权项
地址